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Difference between revisions of "20 nm lithography process"

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| 64 nm || 0.67x || 67 nm || 0.70x
 
| 64 nm || 0.67x || 67 nm || 0.70x
 
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| ? µm<sup>2</sup> || ?x || 0.07 µm<sup>2</sup> || 0.45x
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| ? µm<sup>2</sup> || ?x || 0.07 µm<sup>2</sup> || 0.55x
 
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Revision as of 05:31, 24 April 2016

The 20 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 22 nm and 16 nm processes. Commercial integrated circuit manufacturing using 20 nm process began in 2014. This technology superseded by commercial 16 nm process.

Industry

Fab
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Samsung TSMC
Value 28 nm Δ Value 28 nm Δ
64 nm 0.71x 87 nm 0.71x
64 nm 0.67x 67 nm 0.70x
 ? µm2  ?x 0.07 µm2 0.55x

20 nm Microprocessors

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20 nm System on Chips

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20 nm Microarchitectures

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