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Difference between revisions of "20 nm lithography process"

(Industry)
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| 86 nm || 0.75x || 87 nm || 0.71x
 
| 86 nm || 0.75x || 87 nm || 0.71x
 
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| 64 nm || 0.71x || 67 nm || 0.70x
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| 64 nm || 0.56x || 67 nm || 0.70x
 
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| 0.081 µm² || 0.675x || 0.081 µm² || 0.64x
 
| 0.081 µm² || 0.675x || 0.081 µm² || 0.64x

Revision as of 18:51, 28 March 2017

The 20 nanometer (20 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 22 nm and 16 nm processes. The term "20 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial integrated circuit manufacturing using 20 nm process began in 2014. This technology superseded by commercial 16 nm process.

Industry

Fab
Process Name​
Transistor​
Wafer​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Samsung TSMC
20LPM  
Planar
300 mm
Value 28 nm Δ Value 28 nm Δ
86 nm 0.75x 87 nm 0.71x
64 nm 0.56x 67 nm 0.70x
0.081 µm² 0.675x 0.081 µm² 0.64x

TSMC

TSMC demonstrated their 112 Mebibit SRAM wafer from their 20 nm HKMG process at the 2013 IEEE ISSCC.

References

  • Shang, Huiling, et al. "High performance bulk planar 20nm CMOS technology for low power mobile applications." VLSI Technology (VLSIT), 2012 Symposium on. IEEE, 2012.

20 nm Microprocessors

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20 nm Microarchitectures

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References

  • Chang, Jonathan, et al. "A 20nm 112Mb SRAM in High-к metal-gate with assist circuitry for low-leakage and low-V MIN applications." Solid-State Circuits Conference Digest of Technical Papers (ISSCC), 2013 IEEE International. IEEE, 2013.