From WikiChip
20 µm lithography process
Revision as of 08:32, 27 April 2016 by Inject (talk | contribs)

The 20 µm lithography process was the semiconductor process technology used by semiconductor companies during the mid to late 1960s. 20 µm was roughly the pitch between the centers of two smallest-sized transistors. The typical wafer size for this process at companies such as Fairchild was 0.875 inch (22 mm). The standard transistor packages those years were the TO-5 and TO-18 (Transistor Outline) metal-can packages.

Industry

Fab
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Technology
RCA
1968
 ? nm
 ? nm
CMOS

20 µm Chips

  • RCA

This list is incomplete; you can help by expanding it.