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Difference between revisions of "2.5 µm lithography process"

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{{Lithography processes}}
 
{{Lithography processes}}
 
The '''2.5 μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by [[2 µm]], [[1.5 µm]], and [[1 µm]] processes.
 
The '''2.5 μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by [[2 µm]], [[1.5 µm]], and [[1 µm]] processes.
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== Industry ==
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=== Harris ===
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Harris Corporation operated a 2.5 μm CMOS process, '''SAJI IV''' (Self-Aligned) .
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== 2.5 μm microprocessors ==
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* DEC
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** {{decc|J11}}
  
 
== 2.5 μm microcontrollers ==
 
== 2.5 μm microcontrollers ==
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{{expand list}}
 
{{expand list}}
  
 
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[[category:lithography]]
 
 
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Latest revision as of 06:20, 20 July 2018

The 2.5 μm lithography process was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by 2 µm, 1.5 µm, and 1 µm processes.

Industry[edit]

Harris[edit]

Harris Corporation operated a 2.5 μm CMOS process, SAJI IV (Self-Aligned) .

2.5 μm microprocessors[edit]

2.5 μm microcontrollers[edit]

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