Revision as of 03:09, 26 April 2016

Semiconductor lithography processes technology

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The 16 nm lithography process is a full node semiconductor manufacturing process following the 20 nm process stopgap. Commercial integrated circuit manufacturing using 16 nm process began in 2014. The term "16 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. This technology is set to replaced by 14 nm process (HN) (2014) and 10 nm process (FN) in 2017.

Industry

16 nm Microprocessors

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16 nm System on Chips

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16 nm Microarchitectures

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