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1.5 µm lithography process
Revision as of 13:12, 26 April 2016 by Inject (talk | contribs) (1.5 µm Microprocessors)

The 1.5 µm lithography process was the semiconductor process technology used by the major semiconductor companies in the mid 1980s. By the late 80s this process was replaced by 1.3 µm, 1.2 µm, and 1 µm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
Metal Layers​​
SRAM bit cell​
Wafer
Intel Intel HP
P646 NMOS III
1982 1985 1981
 ? nm  ? nm 1.5 µm
 ? nm  ? nm 2.5 µm
2
 ? µm2  ? µm2
125 mm 150 mm

Design Rules

1.5 µm Microprocessors

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