From WikiChip
1.2 µm lithography process
Revision as of 22:28, 24 April 2016 by David (talk | contribs) (Created page with "{{lithography processes}} The '''1.2 µm lithography process''' was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel NEC
 
1987 1991
Value Value
 ? nm  ? nm
 ? nm  ? nm
 ? µm2  ? µm2

1.2 µm Microprocessors