From WikiChip
1.2 µm lithography process
Revision as of 23:04, 20 May 2018 by ChippyBot (talk | contribs) (Bot: Automated text replacement (-Category:Lithography +category:lithography))
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.

Industry

Fab
Process Name​
1st Production​
Voltage​
 ​
Gate Length​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel NEC
 
1987 1988
 
Value Value
 ? µm  ? µm
 ? µm  ? µm
 ? µm²  ? µm²

1.2 µm Microprocessors

This list is incomplete; you can help by expanding it.