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Difference between revisions of "1.2 µm lithography process"

(1.2 µm Microprocessors)
(1.2 µm Microprocessors)
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* MIPS (Fab'ed by [[NEC]])
 
* MIPS (Fab'ed by [[NEC]])
 
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** {{mips|R3000}}
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[[Category:Lithography]]
 
[[Category:Lithography]]

Revision as of 23:16, 24 April 2016

The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel NEC
 
1987 1991
Value Value
 ? nm  ? nm
 ? nm  ? nm
 ? µm2  ? µm2

1.2 µm Microprocessors

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