Revision as of 03:53, 24 May 2016

Semiconductor lithography processes technology

1 nm • 18A 2 nm • 3 nm 5 nm • 7 nm 10 nm • 12 nm 14 nm • 16 nm 20 nm • 22 nm 28 nm • 32 nm 40 nm • 45 nm 55 nm • 65 nm 80 nm • 90 nm 110 nm • 130 nm 150 nm • 180 nm 220 nm • 240 nm 250 nm • 280 nm 350 nm • 500 nm 600 nm • 650 nm 700 nm • 750 nm 800 nm 1 µm • 1.2 µm 1.3 µm • 1.5 µm 2 µm • 2.5 µm 3 µm • 3.5 µm 5 µm • 6 µm 7 µm • 8 µm 10 µm • 16 µm 20 µm • 50 µm

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The 600 nanometer (600 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.

Industry

600 nm Microprocessors

• Intel
  • Pentium
  • Pentium Overdrive
  • Pentium Pro
• MIPS
  • R4400

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600 nm Microarchitectures

This list is incomplete; you can help by expanding it.