From WikiChip
Editing 180 nm lithography process
Warning: You are not logged in. Your IP address will be publicly visible if you make any edits. If you log in or create an account, your edits will be attributed to your username, along with other benefits.
The edit can be undone.
Please check the comparison below to verify that this is what you want to do, and then save the changes below to finish undoing the edit.
This page supports semantic in-text annotations (e.g. "[[Is specified as::World Heritage Site]]") to build structured and queryable content provided by Semantic MediaWiki. For a comprehensive description on how to use annotations or the #ask parser function, please have a look at the getting started, in-text annotation, or inline queries help pages.
Latest revision | Your text | ||
Line 1: | Line 1: | ||
{{lithography processes}} | {{lithography processes}} | ||
− | The ''' | + | The '''180 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[220 nm lithography process|220 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 180 nm process began in late 1998. This technology was replaced by with [[150 nm lithography process|150 nm process]] (HN) in 2000 and [[130 nm lithography process|130 nm process]] (FN) in 2001. |
== Industry == | == Industry == | ||
The 180 nm process was first to use Cu metalization as a replacement for Al for interconnects. | The 180 nm process was first to use Cu metalization as a replacement for Al for interconnects. | ||
+ | == Industry == | ||
{{scrolling table/top|style=text-align: right; | first=Fab | {{scrolling table/top|style=text-align: right; | first=Fab | ||
|Process Name | |Process Name | ||
|1st Production | |1st Production | ||
− | |||
|Metal Layers | |Metal Layers | ||
| | | | ||
Line 21: | Line 21: | ||
|- style="text-align: center;" | |- style="text-align: center;" | ||
| colspan="2" | 1999 || colspan="2" | 2000 || colspan="2" | 2000 || colspan="2" | 2000 || colspan="2" | 1998 || colspan="2" | 2000 || colspan="2" | 2001 || colspan="2" | || colspan="2" | 2000 || colspan="2" | 1999 | | colspan="2" | 1999 || colspan="2" | 2000 || colspan="2" | 2000 || colspan="2" | 2000 || colspan="2" | 1998 || colspan="2" | 2000 || colspan="2" | 2001 || colspan="2" | || colspan="2" | 2000 || colspan="2" | 1999 | ||
− | |||
− | |||
|- style="text-align: center;" | |- style="text-align: center;" | ||
| colspan="2" | 7 || colspan="2" | 6 || colspan="2" | 6 || colspan="2" | 7 || colspan="2" | 7 || colspan="2" | || colspan="2" | || colspan="2" | 6 || colspan="2" | 5 || colspan="2" | | | colspan="2" | 7 || colspan="2" | 6 || colspan="2" | 6 || colspan="2" | 7 || colspan="2" | 7 || colspan="2" | || colspan="2" | || colspan="2" | 6 || colspan="2" | 5 || colspan="2" | | ||
Line 28: | Line 26: | ||
! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[220 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ | ! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[220 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ !! Value !! [[250 nm]] Δ | ||
|- | |- | ||
− | | 480 nm || 0.96x || ? nm || ?x || | + | | 480 nm || 0.96x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x |
|- | |- | ||
− | | 500 nm || 0.82x || ? nm || ?x || | + | | 500 nm || 0.82x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x |
|- | |- | ||
− | | 5.59 µm<sup>2</sup> || 0.54x || 4.18 µm<sup>2</sup> || ?x || 4.65 | + | | 5.59 µm<sup>2</sup> || 0.54x || 4.18 µm<sup>2</sup> || ?x || 4.65 || 0.62x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x |
{{scrolling table/end}} | {{scrolling table/end}} | ||
== 180 nm Microprocessors== | == 180 nm Microprocessors== | ||
* AMD | * AMD | ||
− | + | ** {{amd|Athlon}} | |
− | + | ** {{amd|Athlon MP}} | |
− | + | ** {{amd|Athlon XP}} | |
− | * | ||
− | |||
− | |||
− | * {{amd|Athlon}} | ||
− | * | ||
− | * {{amd|Athlon MP}} | ||
− | * {{amd|Athlon XP | ||
− | |||
− | }} | ||
* Cyrix | * Cyrix | ||
** {{cyrix|Cyrix III}} | ** {{cyrix|Cyrix III}} | ||
Line 57: | Line 46: | ||
* HAL (Fujitsu) | * HAL (Fujitsu) | ||
** {{hal|SPARC64 GP}} | ** {{hal|SPARC64 GP}} | ||
− | |||
− | |||
* HP | * HP | ||
** {{hp|PA-8700}} | ** {{hp|PA-8700}} | ||
Line 64: | Line 51: | ||
* IBM | * IBM | ||
** {{ibm|RS64 IV}} | ** {{ibm|RS64 IV}} | ||
− | |||
* Intel | * Intel | ||
** {{intel|Itanium}} | ** {{intel|Itanium}} | ||
Line 70: | Line 56: | ||
** {{intel|Mobile Pentium III}} | ** {{intel|Mobile Pentium III}} | ||
** {{intel|Pentium 4}} | ** {{intel|Pentium 4}} | ||
− | |||
− | |||
* Motorola | * Motorola | ||
** {{motorola|PowerPC}} | ** {{motorola|PowerPC}} | ||
− | |||
− | |||
− | |||
− | |||
* Sun | * Sun | ||
** {{sun|UltraSPARC IIi}} | ** {{sun|UltraSPARC IIi}} | ||
** {{sun|UltraSPARC IIe}} | ** {{sun|UltraSPARC IIe}} | ||
− | |||
− | |||
{{expand list}} | {{expand list}} | ||
== 180 nm Microarchitectures == | == 180 nm Microarchitectures == | ||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
{{expand list}} | {{expand list}} | ||
− | |||
− |